THE EVOLUTION OF SPUTTERED IRON NITRIDE THIN-FILMS UNDER THERMAL-TREATMENT

被引：15

作者：

MOSCA, DH ^{[1
]}

TEIXEIRA, SR ^{[1
]}

DIONISIO, PH ^{[1
]}

BAUMVOL, IJR ^{[1
]}

SCHREINER, WH ^{[1
]}

MONTEIRO, WA ^{[1
]}

机构：

[1] IPEN, BR-05508 SAO PAULO, BRAZIL

来源：

JOURNAL OF APPLIED PHYSICS | 1991年 / 69卷 / 01期

关键词：

D O I：

10.1063/1.347761

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The thermal evolution of reactively sputtered iron nitride thin films has been investigated by x-ray diffraction, Mossbauer conversion electron spectroscopy, transmission electron microscopy, and magnetic measurements. The results show that, independently of the original nitrogen content of the films, a similar composition of the end products after the 500-degrees-C annealings is reached, being all composed of alpha-Fe plus gamma'-Fe4N in a wide range of relative proportions. The magnetic characteristics, however, are different depending on the nitrogen content of the as-deposited films.

引用

页码：261 / 267

页数：7

共 30 条

[1]

CHABANEL M, 1968, CR ACAD SCI A B, V226, P419

[2] STRUCTURE AND MAGNETIC-PROPERTIES OF RF REACTIVELY SPUTTERED IRON NITRIDE THIN-FILMS [J].