MEASUREMENT OF STRESS IN NICKEL-OXIDE LAYERS BY DIFFRACTION OF SYNCHROTRON RADIATION

被引:32
作者
FITCH, AN
CATLOW, CRA
ATKINSON, A
机构
[1] UCL ROYAL INST GREAT BRITAIN, LONDON W1X 4BS, ENGLAND
[2] AEA TECHNOL, HARWELL LAB, DEPT MAT CHEM, DIDCOT OX11 0RA, OXON, ENGLAND
关键词
D O I
10.1007/BF01130172
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The average in-plane stress in a number of polycrystalline NiO thermal oxidation scales has been measured by the sin2-psi technique at the Synchrotron Radiation Source, Daresbury, using the high-resolution diffractometer 8.3, which exploits parallel-beam X-ray optics. There are a number of distinct advantages for stress measurements using this arrangement. Shifts in peak positions of much less than 0.005-degrees can be accurately measured, and the tunability of the incident radiation allows control over the depth of penetration of the X-rays into the surface of the specimen.
引用
收藏
页码:2300 / 2304
页数:5
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