CORROSION STABILITY OF TIN PREPARED BY ION-IMPLANTATION AND PVD

被引：43

作者：

HEIDE, N

SCHULTZE, JW

机构：

[1] Institut für Physikalische Chemie und Elektrochemie, Heinrich-Heine-Universität

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1993年 / 80-1卷 / pt 2期

关键词：

D O I：

10.1016/0168-583X(93)96162-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Thermodynamic U/pH diagrams for TiN were calculated which predict only a small range of stability in alkaline solutions. In contrast, electrochemical experiments in solutions of different pH values show high stability against oxidation and reduction. The properties of TiN layers were investigated by potentiodynamic, potentiostatic and open circuit experiments. The observations were compared to results from XPS. Corrosion measurements with nitrogen implanted Ti revealed corrosion resistance even in hot concentrated acids. This feature could not be found for TiN prepared by physical vapour deposition. The higher corrosion rates of PVD samples in contrast to layers formed by ion implantation refer to their columnar structure. Subsequent ion implantation of TiN-PVD decreases the current densities by a factor of 10.

引用

页码：467 / 471

页数：5

共 6 条

[1] SURFACE CHARACTERIZATION AND ELECTROCHEMICAL-BEHAVIOR OF NITROGEN-IMPLANTED AND CARBON-IMPLANTED TITANIUM
HEIDE, N
SIEMENSMEYER, B
SCHULTZE, JW
[J]. SURFACE AND INTERFACE ANALYSIS, 1992, 19 (1-12) : 423 - 429
[2] HEIDE N, THESIS H HEINE U DUS
[3] A MODEL FOR THE ELECTROCHEMICAL-BEHAVIOR OF TIN AND TIC
SCHMICKLER, W
SCHULTZE, JW
[J]. BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1992, 96 (06): : 760 - 764
[4] SCHREY A, 1992, WERK KORR, V43, P511
[5] XPS AND ELECTROCHEMICAL STUDIES OF THIN TIN LAYERS
SIEMENSMEYER, B
BADE, K
SCHULTZE, JW
[J]. BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1991, 95 (11): : 1461 - 1469
[6] SIEMENSMEYER B, 1992, THESIS H HEINE U DUS

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