TEMPERATURE-DEPENDENCE OF THE STRESS IN PSG-AL-SI STRUCTURES

被引：4

作者：

SUGAKI, S

SHINTANI, A

NAKASHIMA, H

机构：

来源：

THIN SOLID FILMS | 1981年 / 82卷 / 02期

关键词：

D O I：

10.1016/0040-6090(81)90437-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：143 / 150

页数：8

共 16 条

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[4] DETERMINATION OF STRESS IN FILMS ON SINGLE CRYSTALLINE SILICON SUBSTRATES [J].

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[5]

KERN W, 1976, RCA REV, V37, P3

[6] REVERSIBLE HILLOCK GROWTH IN THIN FILMS [J].

LAHIRI, SK ;

WELLS, OC .

APPLIED PHYSICS LETTERS, 1969, 15 (07) :234-&

[7]

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[8] THERMAL CYCLING AND SURFACE RECONSTRUCTION IN ALUMINUM THIN FILMS [J].

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[9]

SHINTANI A, 1980, J APPL PHYS, V51, P4179

[10]

SILVERMAN S, 1968, J ELECTROCHEM SOC, V115, P674

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