LASER PLASMA SOURCES FOR PROXIMITY PRINTING OR PROJECTION X-RAY-LITHOGRAPHY

被引：29

作者：

CHAKER, M ^{[1
]}

LAFONTAINE, B ^{[1
]}

COTE, CY ^{[1
]}

KIEFFER, JC ^{[1
]}

PEPIN, H ^{[1
]}

TALON, MH ^{[1
]}

ENRIGHT, GD ^{[1
]}

VILLENEUVE, DM ^{[1
]}

机构：

[1] NATL RES COUNCIL CANADA,OTTAWA K1A 0R6,ONTARIO,CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1992年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.585921

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this article, we present a theoretical and experimental study of the x-ray emission produced by laser plasma sources in different spectral ranges appropriate for x-ray lithography either in proximity printing (XRL) or projection (XRPL) approaches. For XRPL application, experiments using 10 ns laser pulses show that the maximum conversion efficiency in the (80-250 eV) range is attained at I = 10(11) W cm-2 whereas for 25 ns pulses and I less-than-or-equal-to 6 X 10(11) W cm-2, it is still increasing with laser intensity. On the other hand, higher laser intensities are required to obtain a high conversion efficiency for XRL (0.9-1.4 keV). Efficient emission peaked at 1.1 keV can be achieved for I > 10(13) W cm-2 with copper targets and pulse duration shorter than 5 ns. For iron line emission (peak at 0.9 keV), the laser intensity can be lower (I = 5 X 10(12) W cm-2) and the pulse duration longer (tau(p) = 10 ns). Finally, we discuss the different approaches which may lead to the appropriate laser design.

引用

页码：3239 / 3242

页数：4

共 27 条

[1] X-RAY CONVERSION EFFICIENCY AS A FUNCTION OF ATOMIC-NUMBER FOR 0.26-MU-M-LASER - IRRADIATED TARGETS [J].