SILICON HOMOEPITAXIAL THIN-FILMS VIA SILANE PYROLYSIS - HEED AND AUGER-ELECTRON SPECTROSCOPY STUDY

被引:80
作者
HENDERSON, RC
HELM, RF
机构
关键词
D O I
10.1016/0039-6028(72)90005-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:310 / +
页数:1
相关论文
共 50 条
[21]   STUDY OF THE NUCLEATION PROCESS IN THIN FILMS BY THE AUGER-ELECTRON SPECTROSCOPY METHOD. [J].
Tyuliyev, G.T. ;
Yelovikov, S.S. ;
Dubinina, Ye.M. .
Radio Engineering and Electronic Physics (English translation of Radiotekhnika i Elektronika), 1981, 26 (10) :101-104
[22]   COMPOSITIONAL ANALYSIS OF LEAD TITANATE THIN-FILMS BY AUGER-ELECTRON SPECTROSCOPY AND THEIR ELECTRICAL-PROPERTIES [J].
YOON, SG ;
LEE, HY ;
KIM, HG .
THIN SOLID FILMS, 1989, 171 (02) :251-262
[23]   AN INVESTIGATION OF THIN TITANIUM DIBORIDE FILMS BY AUGER-ELECTRON SPECTROSCOPY [J].
OSIPOV, KA ;
LAZAREV, EM ;
BOROVICH, TL ;
KOROTKOV, NA ;
YUSIPOV, NY .
INORGANIC MATERIALS, 1981, 17 (04) :417-420
[24]   AUGER-ELECTRON SPECTROSCOPY OF SILICON SURFACES [J].
VLACHOVA, B .
CZECHOSLOVAK JOURNAL OF PHYSICS, 1973, B 23 (09) :931-946
[25]   AUGER-ELECTRON SPECTROSCOPY X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF TI-B-N THIN-FILMS [J].
BAKER, MA ;
STEINER, A ;
HAUPT, J ;
GISSLER, W .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :1633-1638
[26]   AUGER-ELECTRON SPECTROSCOPY STUDY OF ELECTROPOLISHING FILMS ON TITANIUM [J].
MATHIEU, JB ;
MATHIEU, HJ ;
LANDOLT, D .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) :C280-C280
[27]   ION SCATTERING AND AUGER-ELECTRON SPECTROMETRIC STUDIES OF TIC THIN-FILMS [J].
TONGSON, L ;
ODREY, N ;
HAM, I ;
BIGGERS, JV ;
KNOX, BE .
AMERICAN CERAMIC SOCIETY BULLETIN, 1976, 55 (04) :393-393
[28]   AUGER-ELECTRON SPECTROSCOPY STUDIES OF SILICON-NITRIDE, OXIDE, AND OXYNITRIDE THIN-FILMS - MINIMIZATION OF SURFACE DAMAGE BY ARGON AND ELECTRON-BEAMS [J].
CHAO, SS ;
TYLER, JE ;
TSU, DV ;
LUCOVSKY, G ;
MANTINI, MJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1283-1287
[29]   STUDY OF PD2SI FILMS ON SILICON USING AUGER-ELECTRON SPECTROSCOPY [J].
FERTIG, DJ ;
ROBINSON, GY .
SOLID-STATE ELECTRONICS, 1976, 19 (05) :407-413
[30]   Auger electron spectroscopy study of SiC thin films deposited on silicon [J].
Lei, YM ;
Yu, YH ;
Cheng, LL ;
Ren, CX ;
Zou, SC .
VACUUM, 2000, 58 (04) :602-608