INFRARED-LASER PHOTOCHEMISTRY OF SILANE

被引:87
作者
DEUTSCH, TF
机构
[1] Lincoln Laboratory, Massachusetts Institute of Technology, Lexington
关键词
D O I
10.1063/1.437598
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The infrared photochemistry of silane has been investigated using CO 2 TEA laser excitation. Energy deposition measurements show that only 1.5 photons/molecule are absorbed at a pressure of 1 Torr and a P(20) fluence of 0.8 J/cm2, while at 10 Torr 7.5 photons/molecule are absorbed. The visible luminescence that accompanies the dissociation of silane is due to molecular and atomic hydrogen. The thresholds for both luminescence and dissociation increase sharply as the pressure drops below 5 Torr, indicating that dissociation is a collisional process. Silane d1 and d 2 have been produced by irradiating silane-deuterium mixes. © 1979 American Institute of Physics.
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页码:1187 / 1192
页数:6
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