LUBRICATION SYSTEM IN ULTRAHIGH-VACUUM

被引：0
|
作者：
OHMAE, N
机构：
来源：
TETSU TO HAGANE-JOURNAL OF THE IRON AND STEEL INSTITUTE OF JAPAN | 1987年 / 73卷 / 10期
关键词：
D O I：
10.2355/tetsutohagane1955.73.10_1297
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
收藏
页码：1297 / 1302
页数：6
相关论文
共 50 条
  • [21] THE ULTRAHIGH-VACUUM SYSTEM OF THE ELECTRON COOLING DEVICE FOR LEAR
    HABFAST, C
    GIRARDINI, M
    HUTTEN, L
    PONCET, A
    POTH, H
    SELIGMANN, B
    WOLF, A
    VAKUUM-TECHNIK, 1985, 34 (07): : 195 - 200
  • [22] ACCURATE, WIDE RANGE ULTRAHIGH-VACUUM CALIBRATION SYSTEM
    FOWLER, P
    BROCK, FJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (05): : 507 - &
  • [23] Polycrystalline silicon formed by ultrahigh-vacuum sputtering system
    1600, American Inst of Physics, Woodbury, NY, USA (78):
  • [24] A SIMPLE ULTRAHIGH-VACUUM COMPATIBLE SAMPLE COOLING SYSTEM
    CHABAN, EE
    CITRIN, PH
    SETTE, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (05): : 3018 - 3019
  • [25] ULTRAHIGH-VACUUM CRYOSORPTION PUMP
    PITLOR, JR
    SIMSON, JP
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1964, 1 (02): : 76 - &
  • [26] ULTRAHIGH-VACUUM LINE COMPONENTS
    WESTON, GF
    VACUUM, 1984, 34 (06) : 619 - 629
  • [27] VALVES FOR HIGH AND ULTRAHIGH-VACUUM
    TINNER, F
    VACUUM, 1978, 28 (10-1) : 427 - 427
  • [28] ULTRAHIGH-VACUUM IN THE SEMICONDUCTOR INDUSTRY
    OHANLON, JF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 921 - 927
  • [29] ULTRAHIGH-VACUUM HEATED APPARATUS
    PALATNIK, LS
    FEDORENK.AI
    LEBEDEVA, MV
    USENKO, MY
    PRIBORY I TEKHNIKA EKSPERIMENTA, 1973, (02): : 161 - 162
  • [30] METHODS FOR PRODUCING ULTRAHIGH-VACUUM
    BERGANDT, E
    HENNING, H
    VAKUUM-TECHNIK, 1976, 25 (05): : 131 - 140
12345