LIQUID JUNCTIONS FOR CHARACTERIZATION OF ELECTRONIC MATERIALS .4. IMPEDANCE SPECTROSCOPY OF REACTIVE ION-ETCHED SI

被引：7

作者：

FANTINI, MCA ^{[1
]}

SHEN, WM ^{[1
]}

TOMKIEWICZ, M ^{[1
]}

GAMBINO, JP ^{[1
]}

机构：

[1] IBM CORP,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 05期

关键词：

D O I：

10.1063/1.344310

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2148 / 2155

页数：8

共 36 条

[11] PERFORMANCE OF 1.5-MU-M LAMBDA-4-SHIFTED DFB-SIPBH LASER-DIODES WITH ELECTRON-BEAM DEFINED AND REACTIVE ION-ETCHED GRATINGS
ZAH, CE
CANEAU, C
MENOCAL, SG
GOZDZ, AS
LIN, PSD
FAVIRE, F
YIYAN, A
LEE, TP
DENTAI, AG
JOYNER, CH
ELECTRONICS LETTERS, 1989, 25 (10) : 650 - 652
[12] EFFECT OF CATHODE MATERIALS ON REACTIVE ION ETCHING OF SI AND SIO2 IN CF4
EPHRATH, LM
JOURNAL OF ELECTRONIC MATERIALS, 1976, 5 (04) : 449 - 449
[13] Characterization of heavy deposits on InP mesa sidewalls reactive ion etched using CH4/H2 plasma
Lee, BT
Park, JS
Kim, DK
Ahn, JH
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1999, 14 (04) : 345 - 349
[14] Characterization of n-Si/RbAg4I5 interfaces by photocurrent measurements and electrochemical impedance spectroscopy
Ohta, N
Takada, K
Sasaki, T
Watanabe, M
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (06) : A1241 - A1247
[15] X-ray photoelectron spectroscopy damage characterization of reactively ion etched InP in CH4-H2 plasmas
J Vac Sci Technol B, 4 (1823):
[16] X-ray photoelectron spectroscopy damage characterization of reactively ion etched InP in CH4-H2 plasmas
Feurprier, Y
Cardinaud, C
Turban, G
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (04): : 1823 - 1832
[17] Electrical characterization of Si/Si0.7Ge0.3 quantum well wires fabricated by low damage CF4 reactive ion etching
IBM T.J. Watson Research Cent, Yorktown Heights, United States
Microelectron Eng, 1-4 (33-36):
[18] Electrical characterization of Si/Si0.7Ge0.3 quantum well wires fabricated by low damage CF4 reactive ion etching
Lee, KY
Koester, SJ
Ismail, K
Chu, JO
MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 33 - 36
[19] STUDIES ON BISMALEIMIDES AND RELATED MATERIALS .4. SYNTHESIS AND CHARACTERIZATION OF NEW BISMALEIMIDES BASED ON TERPHENYL, TETRAPHENYLKETAZINE, AND BISPHENOL A - REACTIVE BUILDING-BLOCKS FOR BISMALEIMIDES
PRESTON, PN
SHAH, VK
SIMPSON, SW
SOUTAR, I
STEWART, NJ
MACROMOLECULES, 1994, 27 (05) : 1147 - 1153
[20] ELECTRON-SPECTROSCOPY OF SI,SIO2 AND SI3N4 SURFACES AFTER O2+ AND N2+ REACTIVE ION-IMPLANTATION
KOVAL, IF
GOISA, SN
MELNIK, PV
NAKHODKIN, NG
FIZIKA TVERDOGO TELA, 1980, 22 (07): : 2003 - 2009

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