PHOTOELECTROCHEMICAL PROPERTIES OF THIN GAMMA-FE203 FILMS FORMED BY MO-CVD TECHNIQUE

被引：6
|
作者：
HARA, N
SUGIMOTO, K
机构：
来源：
JOURNAL OF THE JAPAN INSTITUTE OF METALS | 1988年 / 52卷 / 02期
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D O I：
10.2320/jinstmet1952.52.2_189
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页码：189 / 198
页数：10
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