BIASED SECONDARY-ELECTRON IMAGING IN A UHV-STEM

被引：39

作者：

HEMBREE, GG ^{[1
]}

CROZIER, PA ^{[1
]}

DRUCKER, JS ^{[1
]}

KRISHNAMURTHY, M ^{[1
]}

VENABLES, JA ^{[1
]}

COWLEY, JM ^{[1
]}

机构：

[1] UNIV SUSSEX,SCH MAPS,BRIGHTON BN1 9QH,E SUSSEX,ENGLAND

来源：

ULTRAMICROSCOPY | 1989年 / 31卷 / 01期

关键词：

D O I：

10.1016/0304-3991(89)90040-5

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：111 / 115

页数：5

共 11 条

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[2]

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[3]

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[6] SURFACE MICROSCOPY WITH SCANNED ELECTRON-BEAMS [J].

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[7] HREM, STEM, REM, SEM - AND STM [J].

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[8]

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[9]

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[10] REFLECTION ELECTRON-ENERGY LOSS SPECTROSCOPY (REELS) - A TECHNIQUE FOR THE STUDY OF SURFACES [J].

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