PHOTOEMISSION-STUDY OF A-SI-H/A-SINX-H INTERFACE FORMATION

被引：4
作者：
YANG, L
ABELES, B
EBERHARDT, W
SONDERICKER, D
STASIEWSKI, H
FU, Z
机构：
[1] BROOKHAVEN NATL LAB,UPTON,NY 11973
[2] ACAD SINICA,DALIAN INST CHEM PHYS,DALIAN,PEOPLES R CHINA
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1987年 / 97-8卷
关键词：
D O I：
10.1016/0022-3093(87)90204-3
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：851 / 854
页数：4
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