INFLUENCE OF DEEP TRAPS ON MEASUREMENT OF FREE-CARRIER DISTRIBUTIONS IN SEMICONDUCTORS BY JUNCTION CAPACITANCE TECHNIQUES

被引:269
作者
KIMERLING, LC [1 ]
机构
[1] BELL TEL LABS INC, MURRAY HILL, NJ 07974 USA
关键词
D O I
10.1063/1.1663500
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1839 / 1845
页数:7
相关论文
共 21 条
[1]   SCHOTTKY-BARRIER CAPACITANCE MEASUREMENTS FOR DEEP LEVEL IMPURITY DETERMINATION [J].
BLEICHER, M ;
LANGE, E .
SOLID-STATE ELECTRONICS, 1973, 16 (03) :375-380
[2]   FIELD-INDEPENDENCE OF THERMAL EMISSION RATE IN AU-DOPED SILICON [J].
BRAUN, S ;
GRIMMEISS, HG .
SOLID STATE COMMUNICATIONS, 1972, 11 (10) :1457-+
[3]   A TECHNIQUE FOR DIRECTLY PLOTTING INVERSE DOPING PROFILE OF SEMICONDUCTOR WAFERS [J].
COPELAND, JA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (05) :445-&
[4]   ACCURATE CAPACITANCE CALCULATIONS FOR PN JUNCTIONS CONTAINING TRAPS [J].
EERNISSE, EP .
APPLIED PHYSICS LETTERS, 1971, 18 (05) :183-+
[6]   CALCULATED SMALL-SIGNAL CHARACTERISTICS FOR IRRADIATED PN JUNCTIONS [J].
GWYN, CW .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1972, NS19 (06) :355-361
[7]   ELECTRON-HOLE RECOMBINATION IN GERMANIUM [J].
HALL, RN .
PHYSICAL REVIEW, 1952, 87 (02) :387-387
[8]  
HALL RN, 1951, PHYS REV, V83, P228
[9]  
KIMERLING LC, UNPUBLISHED
[10]   PHOTOCAPACITANCE STUDIES OF OXYGEN DONOR IN GAP I OPTICAL CROSS-SECTIONS, ENERGY-LEVELS, AND CONCENTRATION [J].
KUKIMOTO, H ;
HENRY, CH ;
MERRITT, FR .
PHYSICAL REVIEW B, 1973, 7 (06) :2486-2499