CHARACTERIZATION OF SILICON NITRIDE FILMS

被引：233
作者：
TAFT, EA
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1971年 / 118卷 / 08期
关键词：
D O I：
10.1149/1.2408318
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：1341 / &
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