SURFACE STRESS EFFECTS ON THE THERMODYNAMICS OF EPITAXY

被引：2

作者：

CAMMARATA, RC

SIERADZKI, K

机构：

[1] Dept. of Mater. Sci. and Eng., The Johns Hopkins University, Baltimore, 21218, MD

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1991年 / 20卷 / 10期

关键词：

SURFACE STRESS; THERMODYNAMICS;

D O I：

10.1007/BF02665969

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An analysis of the thermodynamics of epitaxy in thin films is presented which includes the effects of the surface stresses of the free surface and the film-substrate interface. It is shown that these effects, which are usually ignored in the theory of epitaxy, can have a major influence on both the critical thickness for epitaxy and on the partitioning of the misfit strain between the volume elastic strain and interface dislocations.

引用

页码：815 / 817

页数：3

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