THE EFFECT OF POWER ON THE PLASMA-ASSISTED DEPOSITION OF FLUORINATED MONOMERS

被引：27

作者：

DAGOSTINO, R

FAVIA, P

FRACASSI, F

ILLUZZI, F

机构：

[1] UNIV BARI,DEPT CHEM,CNR,CTR STUDIO CHIM PLASMI,4 TRAV 200 RE DAVID,I-70126 BARI,ITALY

[2] THOMSON MICROELECTR,CENT RES & DEV SGS,I-20041 AGRATE BRIANZA,ITALY

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 1990年 / 28卷 / 12期

关键词：

D O I：

10.1002/pola.1990.080281217

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The effect of power variation on the polymerization kinetics and on the polymer structure is reported for RF glow discharges fed with C2F6–H2 mixtures. Both deposition rate and polymer structure trends can be correlated to the variations of gas‐phase species density (atoms, radicals, and charged species) and can be explained by considering the competition of the deposition and etching process. Copyright © 1990 John Wiley & Sons, Inc.

引用

页码：3387 / 3402

页数：16

共 19 条

[1]

ASANO Y, 1983, JPN J APPL PHYS 1, V22, P480, DOI 10.1143/JJAP.22.480

[2]

COLBURN JW, 1981, J APPL PHYS, V51, P3143

[3] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J].