APPLICATION OF RF DISCHARGES TO SPUTTERING

[1] SPUTTERING OF DIELECTRICS BY HIGH-FREQUENCY FIELDS [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) : 2991 - &

[2] DIELECTRIC THIN FILMS THROUGH RF SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) : 574 - &

[3] DAVIDSE PD, 1966, SCP SOLID STATE DEC, P36

[4] DAVIDSE PD, 1965, 3 INT VAC C STUTTG

[5] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE [J]. PHYSICAL REVIEW, 1963, 131 (01): : 219 - &

[6] HASTED JB, 1964, PHYSICS ATOMIC COLLI

[7] HAY RH, 1938, CAN J RES A, V16, P191

[8] RE-EMISSION COEFFICIENTS OF SI AND SIO2 FILMS DEPOSITED THROUGH RF AND DC SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (12) : 4656 - &

[9] LEVITSKII SM, 1957, SOV PHYS-TECH PHYS, V27, P913

[10] STUDIES IN HIGH FREQUENCY DISCHARGES [J]. CANADIAN JOURNAL OF RESEARCH SECTION A-PHYSICAL SCIENCES, 1948, 26 (04): : 205 - &

[1] SPUTTERING OF DIELECTRICS BY HIGH-FREQUENCY FIELDS [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) : 2991 - &

[2] DIELECTRIC THIN FILMS THROUGH RF SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) : 574 - &

[3] DAVIDSE PD, 1966, SCP SOLID STATE DEC, P36

[4] DAVIDSE PD, 1965, 3 INT VAC C STUTTG

[5] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE [J]. PHYSICAL REVIEW, 1963, 131 (01): : 219 - &

[6] HASTED JB, 1964, PHYSICS ATOMIC COLLI

[7] HAY RH, 1938, CAN J RES A, V16, P191

[8] RE-EMISSION COEFFICIENTS OF SI AND SIO2 FILMS DEPOSITED THROUGH RF AND DC SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (12) : 4656 - &

[9] LEVITSKII SM, 1957, SOV PHYS-TECH PHYS, V27, P913

[10] STUDIES IN HIGH FREQUENCY DISCHARGES [J]. CANADIAN JOURNAL OF RESEARCH SECTION A-PHYSICAL SCIENCES, 1948, 26 (04): : 205 - &