PROXIMITY CORRECTION ENHANCEMENTS FOR 1-MUM DENSE CIRCUITS

被引：14

作者：

GROBMAN, WD

SPETH, AJ

CHANG, THP

机构：

来源：

IBM JOURNAL OF RESEARCH AND DEVELOPMENT | 1980年 / 24卷 / 05期

关键词：

Compendex;

D O I：

10.1147/rd.245.0537

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

LITHOGRAPHY

引用

页码：537 / 544

页数：8

共 26 条

[11]

HOFER DC, 1979, 15TH P S EL ION LAS

[12]

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[13]

KYSER DF, 1974, 6TH P INT C EL ION B, P205

[14]

NEUREUTHER A, 1978, 8TH P INT C EL ION B, P265

[15] CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .1. THEORY [J].

PARIKH, M .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) :4371-4377

[16] CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .3. EXPERIMENTS [J].

PARIKH, M .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) :4383-4387

[17] CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .2. IMPLEMENTATION [J].

PARIKH, M .

JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) :4378-4382

[18] SELF-CONSISTENT PROXIMITY EFFECT CORRECTION TECHNIQUE FOR RESIST EXPOSURE (SPECTER) [J].

PARIKH, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :931-933

[19] PROXIMITY EFFECTS IN ELECTRON LITHOGRAPHY - MAGNITUDE AND CORRECTION TECHNIQUES [J].

PARIKH, M .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1980, 24 (04) :438-457

[20] ELECTRON-BEAM LITHOGRAPHIC PATTERN GENERATION SYSTEM [J].

PATLACH, AM ;

JASKAR, PR ;

STUDWELL, TW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :874-877

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