EFFECTS OF GROWTH-CONDITIONS ON THE COMPOSITION OF CVT AND PVT GROWN HG1-XCDXTE EPITAXIAL LAYERS

被引:16
作者
SHA, YG
WIEDEMEIER, H
机构
[1] Department of Chemistry, Rensselaer Polytechnic Institute, Troy, 12180-3590, New York
关键词
HGCDTE; CVT; HGI2; EPITAXIAL GROWTH;
D O I
10.1007/BF02655429
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Single crystal epitaxial layers of Hg1-xCdxTe were grown on CdTe substrates employing the chemical and physical va.por transport techniques. Different growth temperatures and various pressures of HgI2 as a transport agent were used while the source materials had compositions of either x = 0.4 or x = 0.6. The epilayers are of nearly uniform composition to a depth of about one-half of the layer thickness. The HgI2 pressure and the growth temperature used for the growth experiments have significant effects on the layer composition. The desired epilayer composition of x = 0.2 can be achieved with either source compositions by properly adjusting the HgI2 pressure and the growth temperature.
引用
收藏
页码:613 / 617
页数:5
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