CALCULATION OF COMPOSITION VARIATION OF IN1-VGAVAS TERNARY CRYSTALS FOR DIFFUSION AND ELECTROMIGRATION LIMITED GROWTH FROM A TEMPERATURE GRADED SOLUTION WITH SOURCE MATERIAL

被引:12
作者
NAKAJIMA, K
机构
[1] Fujitsu Laboratories Ltd. Atsugi, Atsugi, 243-01
关键词
D O I
10.1016/0022-0248(91)90636-J
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A theoretical model was proposed to calculate composition variation of III-V ternary crystals during growth. In this model, for the first time, phase equilibrium between crystal and growth solution is maintained together with constancy between the transported and incorporated mass or solute atoms at the crystal/solution interface at the same time. This model can be applied to the calculation of the diffusion and electromigration limited growth in a temperature-graded solution with source material such as the source-current-controlled (SCC) growth method. The composition variation of In(1-v)Ga(v)As crystals grown by diffusion and electromigration was calculated by this model. Incorporation of two kinds of solute elements, Ga and As, into crystals through the crystal/solution interface was considered on the basis of the laws of the phase equilibrium and the constancy of mass. In comparison of the experimental results with the calculated ones, it is found that in the In-Ga-As solution the diffusion coefficient of Ga, D(Ga), is about two times as large as that of As, D(As), and mu-Ga is larger than mu-As. The calculated results of the composition variation show that the composition uniformity in In(1-v)Ga(v)As crystals can be largely improved by controlling the growth parameters such as temperature gradient in the solution, solution length, existence of source material, and electric field.
引用
收藏
页码:781 / 794
页数:14
相关论文
共 35 条
[11]   PELTIER-INDUCED LPE AND COMPOSITION STABILIZATION OF GAALAS [J].
DANIELE, JJ .
APPLIED PHYSICS LETTERS, 1975, 27 (07) :373-375
[12]   PELTIER-INDUCED LIQUID-PHASE EPITAXY AND COMPOSITIONAL CONTROL OF MM-THICK LAYERS OF (AL,GA)AS [J].
DANIELE, JJ ;
HEBLING, AJ .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (06) :4325-4327
[13]  
DECREMOUX B, 1979, I PHYS C SER, V45, P52
[14]  
DOI A, 1978, JPN J APPL PHYS, V17, P503, DOI 10.1143/JJAP.17.503
[15]  
GUGGENHEIM EA, 1967, THERMODYNAMICS, P197
[16]   VARIATION OF SOLID COMPOSITION AND THICKNESS DURING LPE GROWTH OF ALXGA1-XAS [J].
IJUIN, H ;
GONDA, S .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (07) :1109-1111
[17]   COMPUTER SIMULATIONS OF LIQUID-PHASE EPITAXY OF 3-5 TERNARY ALLOYS [J].
IJUIN, H ;
GONDA, SI .
JOURNAL OF CRYSTAL GROWTH, 1976, 33 (02) :215-222
[18]  
ILEGEMS M, 1969, I PHYSICS C SERIES, V7, P3
[19]   DEPENDENCE OF GA1-XALXAS LPE LAYER THICKNESS ON SOLUTION COMPOSITION [J].
ISOZUMI, S ;
KOMATSU, Y ;
OKAZAKI, N ;
KOYAMA, S ;
KOTANI, T .
JOURNAL OF CRYSTAL GROWTH, 1977, 41 (01) :166-171
[20]   LIQUID-PHASE ELECTROEPITAXY - GROWTH KINETICS [J].
JASTRZEBSKI, L ;
LAGOWSKI, J ;
GATOS, HC ;
WITT, AF .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (12) :5909-5919