GROWTH OF THIN PLATINUM FILMS ON HYDROGENATED AMORPHOUS-SILICON AND ITS OXIDE

被引:9
作者
GOLDSTEIN, B
SZOSTAK, DJ
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 03期
关键词
D O I
10.1116/1.570548
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:718 / 720
页数:3
相关论文
共 10 条
[1]   RECENT ADVANCES IN EPITAXY [J].
BAUER, E ;
POPPA, H .
THIN SOLID FILMS, 1972, 12 (01) :167-+
[2]   LOW-TEMPERATURE MIGRATION OF SILICON IN THIN LAYERS OF GOLD AND PLATINUM [J].
HIRAKI, A ;
NICOLET, MA ;
MAYER, JW .
APPLIED PHYSICS LETTERS, 1971, 18 (05) :178-&
[3]   MODEL FOR AUGER-ELECTRON SPECTROSCOPY OF SYSTEMS EXHIBITING LAYER GROWTH, AND ITS APPLICATION TO DEPOSITION OF SILVER ON NICKEL [J].
JACKSON, DC ;
GALLON, TE ;
CHAMBERS, A .
SURFACE SCIENCE, 1973, 36 (02) :381-394
[5]   L1L23V COSTER-KRONIG TRANSITION IN HYDROGENATED AMORPHOUS SILICON [J].
LAZNICKA, M .
SURFACE SCIENCE, 1979, 87 (01) :L260-L262
[6]   PROBING DEPTH IN PHOTOEMISSION AND AUGER-ELECTRON SPECTROSCOPY [J].
LINDAU, I ;
SPICER, WE .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1974, 3 (05) :409-413
[7]  
POATE JM, 1978, THIN FILMS INTERDIFF, P376
[8]   APPLICATION OF AUGER-ELECTRON SPECTROSCOPY TO STUDIES OF SILICON-SILICIDE INTERFACE [J].
ROTH, JA ;
CROWELL, CR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1317-1324
[9]  
TU KN, 1975, APPL PHYS LETT, V27, P221, DOI 10.1063/1.88436
[10]  
WEAST RC, 1978, HDB CHEM PHYSICS