X-RAY PHOTO-ELECTRON SPECTROSCOPY STUDIES OF AG PHOTODOPING IN SE-GE AMORPHOUS FILMS

被引：39

作者：

ZEMBUTSU, S

机构：

来源：

APPLIED PHYSICS LETTERS | 1981年 / 39卷 / 12期

关键词：

D O I：

10.1063/1.92629

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：969 / 971

页数：3

共 11 条

[1] ELECTRON-DIFFRACTION STUDIES OF AG PHOTODOPING IN GEXSE1-X GLASS-FILMS [J].

CHEN, CH ;

TAI, KL .

APPLIED PHYSICS LETTERS, 1980, 37 (07) :605-607

[2]

FRITZSCHE H, 1980, J PHYS SOC JPN, V49, pA39

[3]

KAWAMURA H, 1979, SOLID STATE COMMUN, V32, P83, DOI 10.1016/0038-1098(79)91003-2

[4]

SIEGBAHN K, 1971, ESCA, V104

[5] SUB-MICRON OPTICAL LITHOGRAPHY USING AN INORGANIC RESIST-POLYMER BILEVEL SCHEME [J].

TAI, KL ;

VADIMSKY, RG ;

KEMMERER, CT ;

WAGNER, JS ;

LAMBERTI, VE ;

TIMKO, AG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (05) :1169-1176

[6] BILEVEL HIGH-RESOLUTION PHOTOLITHOGRAPHIC TECHNIQUE FOR USE WITH WAFERS WITH STEPPED AND-OR REFLECTING SURFACES [J].

TAI, KL ;

SINCLAIR, WR ;

VADIMSKY, RG ;

MORAN, JM ;

RAND, MJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1977-1979

[7] REVERSIBLE PHOTOINDUCED CHANGE IN INTERMOLECULAR DISTANCE IN AMORPHOUS AS2S3 NETWORK [J].

TANAKA, K .

APPLIED PHYSICS LETTERS, 1975, 26 (05) :243-245

[8] PHOTOSTRUCTURAL CHANGE OF LATTICE-VIBRATIONAL SPECTRA IN SE-GE CHALCOGENIDE GLASS [J].

UTSUGI, Y ;

MIZUSHIMA, Y .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (06) :3470-3475

[9] NOVEL INORGANIC PHOTORESIST UTILIZING AG PHOTODOPING IN SE-GE GLASS-FILMS [J].

YOSHIKAWA, A ;

OCHI, O ;

NAGAI, H ;

MIZUSHIMA, Y .

APPLIED PHYSICS LETTERS, 1976, 29 (10) :677-679

[10] NEW INORGANIC ELECTRON RESIST OF HIGH CONTRAST [J].

YOSHIKAWA, A ;

OCHI, O ;

NAGAI, H ;

MIZUSHIMA, Y .

APPLIED PHYSICS LETTERS, 1977, 31 (03) :161-163

← 1 2 →