LOGARITHMIC CONDUCTIVITY OF AL-AL2O3-AL TUNNELING JUNCTIONS PRODUCED BY PLASMA-OXIDATION AND BY THERMAL OXIDATION

被引：72
作者：
GUNDLACH, KH
HOLZL, J
机构：
来源：
SURFACE SCIENCE | 1971年 / 27卷 / 01期
关键词：
D O I：
10.1016/0039-6028(71)90166-X
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
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页码：125 / &
相关论文
共 33 条
[1]   PHOTOEMISSIVE DETERMINATION OF BARRIER SHAPE IN TUNNEL JUNCTIONS [J].
BRAUNSTE.A ;
BRAUNSTE.M ;
PICUS, GS ;
MEAD, CA .
PHYSICAL REVIEW LETTERS, 1965, 14 (07) :219-&
[2]   ELECTRON TUNNELING BETWEEN A METAL AND A SEMICONDUCTOR - CHARACTERISTICS OF AL-AL2O3-SNTE AND -GETE JUNCTIONS [J].
CHANG, LL ;
STILES, PJ ;
ESAKI, L .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (11) :4440-&
[3]   EFFECT OF NONPARABOLIC MOMENTUM ON FOWLER-NORDHEIM TUNNELING THROUGH AN INSULATOR [J].
CHANG, LL .
PHYSICS LETTERS A, 1969, A 29 (03) :125-&
[4]   SQUARE-MEAN-ROOT APPROXIMATION FOR EVALUATING ASYMMETRIC TUNNELING CHARACTERISTICS [J].
CHOW, CK .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (02) :559-&
[5]   TUNNELING THROUGH THIN INSULATING LAYERS [J].
FISHER, JC ;
GIAEVER, I .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (02) :172-&
[6]  
FOMICHEV VA, 1967, FIZ TVERD TELA+, V8, P2312
[7]  
FOMICHEV VA, 1966, FIZ TVERD TELA, V8, P2892
[8]  
FRANZ W, 1956, HDB PHYSIK, V17
[9]  
Gericke W., 1970, Physica Status Solidi A, V1, P189, DOI 10.1002/pssa.19700010122
[10]   PHOTOEMISSION OF HOLES AND ELECTRONS FROM ALUMINUM INTO ALUMINUM OXIDE [J].
GOODMAN, AM .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (05) :2176-&
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