LOGARITHMIC CONDUCTIVITY OF AL-AL2O3-AL TUNNELING JUNCTIONS PRODUCED BY PLASMA-OXIDATION AND BY THERMAL OXIDATION

被引：72

作者：

GUNDLACH, KH

HOLZL, J

机构：

来源：

SURFACE SCIENCE | 1971年 / 27卷 / 01期

关键词：

D O I：

10.1016/0039-6028(71)90166-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

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页码：125 / &

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共 33 条

[1] PHOTOEMISSIVE DETERMINATION OF BARRIER SHAPE IN TUNNEL JUNCTIONS
BRAUNSTE.A
BRAUNSTE.M
PICUS, GS
MEAD, CA
[J]. PHYSICAL REVIEW LETTERS, 1965, 14 (07) : 219 - &
[2] ELECTRON TUNNELING BETWEEN A METAL AND A SEMICONDUCTOR - CHARACTERISTICS OF AL-AL2O3-SNTE AND -GETE JUNCTIONS
CHANG, LL
STILES, PJ
ESAKI, L
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (11) : 4440 - &
[3] EFFECT OF NONPARABOLIC MOMENTUM ON FOWLER-NORDHEIM TUNNELING THROUGH AN INSULATOR
CHANG, LL
[J]. PHYSICS LETTERS A, 1969, A 29 (03) : 125 - &
[4] SQUARE-MEAN-ROOT APPROXIMATION FOR EVALUATING ASYMMETRIC TUNNELING CHARACTERISTICS
CHOW, CK
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (02) : 559 - &
[5] TUNNELING THROUGH THIN INSULATING LAYERS
FISHER, JC
GIAEVER, I
[J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (02) : 172 - &
[6] FOMICHEV VA, 1967, FIZ TVERD TELA+, V8, P2312
[7] FOMICHEV VA, 1966, FIZ TVERD TELA, V8, P2892
[8] FRANZ W, 1956, HDB PHYSIK, V17
[9] Gericke W., 1970, Physica Status Solidi A, V1, P189, DOI 10.1002/pssa.19700010122
[10] PHOTOEMISSION OF HOLES AND ELECTRONS FROM ALUMINUM INTO ALUMINUM OXIDE
GOODMAN, AM
[J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (05) : 2176 - &

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