RADIATION ENHANCED ADHESION OF THIN-FILMS

被引：13
|
作者：
COLLIGON, JS
KHEYRANDISH, H
机构：
来源：
VACUUM | 1989年 / 39卷 / 7-8期
关键词：
D O I：
10.1016/0042-207X(89)90021-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：705 / 710
页数：6
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