RADIATION ENHANCED ADHESION OF THIN-FILMS

被引：13

作者：

COLLIGON, JS

KHEYRANDISH, H

机构：

来源：

关键词：

D O I：

10.1016/0042-207X(89)90021-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：705 / 710

页数：6

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[1] RADIATION ENHANCED ADHESION OF INSULATING THIN-FILMS ON SIO2 SUBSTRATES
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