FABRICATION OF 1ST-ORDER GRATINGS FOR 1.5 MU-M DFB LASERS BY HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY

被引：8

作者：

FICE, MJ ^{[1
]}

AHMED, H ^{[1
]}

CLEMENTS, S ^{[1
]}

机构：

[1] STC TECHNOL LTD,HARLOW CM17 9NA,ESSEX,ENGLAND

来源：

ELECTRONICS LETTERS | 1987年 / 23卷 / 11期

关键词：

D O I：

10.1049/el:19870424

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：590 / 592

页数：3

共 7 条

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[6] HIGH-QUALITY INP SURFACE CORRUGATIONS FOR 1.55-MU-M INGAASP DFB LASERS FABRICATED USING ELECTRON-BEAM LITHOGRAPHY [J].

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[7] CONTINUOUS-WAVE OPERATION OF 1.5-MU-M DISTRIBUTED-FEEDBACK RIDGE-WAVEGUIDE LASERS [J].

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