NH2 RADICAL DETECTION BY NH(A) PHOTOFRAGMENT FLUORESCENCE

被引：1

作者：

BIEHL, H ^{[1
]}

STUHL, F ^{[1
]}

机构：

[1] RUHR UNIV BOCHUM,D-44780 BOCHUM,GERMANY

来源：

CHEMICAL PHYSICS LETTERS | 1995年 / 240卷 / 04期

关键词：

D O I：

10.1016/0009-2614(95)00529-D

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Hot NH2 radicals, which are initially generated in the ArF laser photolysis of NH3, relax quickly to ambient temperature in collisions with Ar. They were subsequently detected by the fluorescence of the electronically excited NH(A (3) Pi) photofragments emitting at 336 nm. The photolysis light source for the radicals was a cw Xe lamp at 147 nm. This method makes it possible to monitor NH2 radicals for more than 0.2 s, as they slowly react with each other and diffuse out of the observation volume. The detected NH2 concentrations ranged from similar to 10(13) to similar to 10(15) cm(-3).

引用

页码：369 / 372

页数：4

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