SILICON NITRIDE THIN FILM DIELECTRIC

被引:18
作者
BARNES, CR
GEESNER, CR
机构
关键词
D O I
10.1149/1.2427642
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:98 / 100
页数:3
相关论文
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[3]   THE DEPOSITION OF TANTALUM AND COLUMBIUM FROM THEIR VOLATILIZED HALIDES [J].
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CAMPBELL, IE ;
GONSER, BW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1948, 93 (06) :258-265
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POWELL CF, 1955, VAPOR PLATING, P97