ANODIC FORMATION OF OXIDE FILMS ON SILICON

被引：176
作者：
SCHMIDT, PF
MICHEL, W
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1957年 / 104卷 / 04期
关键词：
D O I：
10.1149/1.2428542
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：230 / 236
页数：7
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