ELECTRONIC-STRUCTURE OF AMORPHOUS SI-N COMPOUNDS

被引:13
|
作者
GURAYA, MM
ASCOLANI, H
ZAMPIERI, G
DASILVA, JHD
CANTAO, MP
CISNEROS, JI
机构
[1] UNIV ESTADUAL CAMPINAS,INST FIS GLEB WATAGHIN,BR-13083970 CAMPINAS,SP,BRAZIL
[2] INST BALSEIRO,RA-8400 BARILOCHE,ARGENTINA
来源
PHYSICAL REVIEW B | 1994年 / 49卷 / 19期
关键词
D O I
10.1103/PhysRevB.49.13446
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have measured valence-band photoemission spectra and dark conductivity of a-SiN(x):H compounds for compositions between x = 0 and x = 1.35. The photoemission spectra have been measured with Zr Mzeta and Al Kalpha radiation of 151.4 and 1486.6 eV, respectively. At hnu = 151.4 eV the spectra resemble directly the total density-of-states (DOS) of the system; the most important change with x is the shift of spectral weight from near the valence-band maximum (VBM) toward the center of the band, indicating the change from a band of Si-Si bonding states to a band of Si-N bonding states. At hnu = 1486.6 eV the spectra are dominated by the contribution of the Si-3s partial DOS; this contribution is located at the bottom of the band and shifts toward higher binding energies with increasing x. We compare our results at x = 0.36 and x = 1.35 with those of two recent calculations. Combining results of the dark-conductivity measurements and the photoemission spectra with a previous determination of the optical gaps we make a plot of the VBM, Fermi-level position, and conduction-band minimum (CBM) versus x. It is shown that the sudden opening of the gap at x approximately 1 is due mainly to the recession of the CBM.
引用
收藏
页码:13446 / 13451
页数:6
相关论文
共 50 条
  • [41] ELECTRONIC-STRUCTURE OF AMORPHOUS-SEMICONDUCTORS
    ADLER, D
    YOFFA, EJ
    PHYSICAL REVIEW LETTERS, 1976, 36 (20) : 1197 - 1200
  • [42] PROPERTIES OF HYDROGENATED AMORPHOUS SI-N PREPARED BY VARIOUS METHODS
    MORIMOTO, A
    TSUJIMURA, Y
    KUMEDA, M
    SHIMIZU, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1985, 24 (11): : 1394 - 1398
  • [43] Electronic Structure of the Si-C-N Amorphous Films
    Zatsepin, D. A.
    Kurmaev, E. Z.
    Moewes, A.
    Cholakh, S. O.
    PHYSICS OF THE SOLID STATE, 2011, 53 (09) : 1806 - 1810
  • [44] Electronic structure of the Si-C-N amorphous films
    D. A. Zatsepin
    E. Z. Kurmaev
    A. Moewes
    S. O. Cholakh
    Physics of the Solid State, 2011, 53 : 1806 - 1810
  • [45] Influence of Si-N complexes on the electronic properties of GaAsN alloys
    Jin, Y.
    He, Y.
    Cheng, H.
    Jock, R. M.
    Dannecker, T.
    Reason, M.
    Mintairov, A. M.
    Kurdak, C.
    Merz, J. L.
    Goldman, R. S.
    APPLIED PHYSICS LETTERS, 2009, 95 (09)
  • [46] ELECTRONIC-STRUCTURE OF SI(111) SURFACES
    HIMPSEL, FJ
    FAUSTER, T
    HOLLINGER, G
    SURFACE SCIENCE, 1983, 132 (1-3) : 22 - 30
  • [47] ELECTRONIC-STRUCTURE OF SI(111) SURFACES
    HANSSON, GV
    BACHRACH, RZ
    BAUER, RS
    CHADI, DJ
    GOPEL, W
    SURFACE SCIENCE, 1980, 99 (01) : 13 - 27
  • [48] PROPERTIES OF HYDROGENATED AMORPHOUS Si-N PREPARED BY VARIOUS METHODS.
    Morimoto, Akiharu
    Tsujimura, Yoshinori
    Kumeda, Minoru
    Shimizu, Tatsuo
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes, 1985, 24 (11): : 1394 - 1398
  • [49] MAGNETORESISTANCE AND ELECTRONIC-STRUCTURE OF SI ON SAPPHIRE
    OHMURA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1976, 15 : 233 - 238
  • [50] JUNCTION BETWEEN AMORPHOUS-GERMANIUM AND MONOCRYSTAL SI-N(P)
    SINHA, NP
    MISRA, M
    SOLID-STATE ELECTRONICS, 1983, 26 (12) : 1177 - 1180