EXCITATIONS AND METASTABILITY IN AMORPHOUS-SEMICONDUCTORS

被引:28
|
作者
LICCIARDELLO, DC
STEIN, DL
HALDANE, FDM
机构
[1] INST MAX VON LAUE PAUL LANGEVIN,CTR TRI 156X,F-38042 GRENOBLE,FRANCE
[2] BELL TEL LABS INC,MURRAY HILL,NJ 07974
关键词
D O I
10.1080/13642818108221894
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:189 / 201
页数:13
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