ION-IMPLANTATION OF NEON IN SILICON FOR PLANAR AMORPHOUS ISOLATION

被引:4
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YASAITIS, JA
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10.1049/el:19780310
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:460 / 462
页数:3
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