INFRARED-LASER RADIATION EFFECTS ON XEF2 INTERACTION WITH SILICON

被引：48
作者：
CHUANG, TJ
机构：
来源：
JOURNAL OF CHEMICAL PHYSICS | 1981年 / 74卷 / 02期
关键词：
D O I：
10.1063/1.441159
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
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页码：1461 / 1466
页数：6
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