NITRATION OF SILICON IN NITROGEN-HYDROGEN MIXTURES ACTIVATED BY PULSE DISCHARGE

被引:0
作者
KNIPOVICH, OM
KONYUSHKINA, NI
VORONINA, VI
NEKRASOV, LI
机构
来源
ZHURNAL FIZICHESKOI KHIMII | 1990年 / 64卷 / 09期
关键词
D O I
暂无
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:2550 / 2552
页数:3
相关论文
共 11 条
[1]  
ASPHES DE, 1982, THIN SOLID FILMS, V89, P249
[2]  
AZZAM R, 1981, ELLIPSOMETRIYA POLYA
[3]  
BARY M, 1973, OSNOVY OPTIKI, P94
[4]  
CHURAEVA MN, 1985, POVERKHNOST FIZIKA K, P132
[5]   PLASMA-ENHANCED THERMAL NITRIDATION OF SILICON [J].
ITO, T ;
KATO, I ;
NOZAKI, T ;
NAKAMURA, T ;
ISHIKAWA, H .
APPLIED PHYSICS LETTERS, 1981, 38 (05) :370-372
[6]   VERY THIN SILICON-NITRIDE FILMS GROWN BY DIRECT THERMAL-REACTION WITH NITROGEN [J].
ITO, T ;
HIJIYA, S ;
NOZAKI, T ;
ARAKAWA, H ;
SHINODA, M ;
FUKUKAWA, Y .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) :448-452
[7]  
KLAIN M, 1976, FIZICHESKAYA KHIMIYA, P307
[8]  
KNIPOVICH OM, 1989, ZH FIZ KHIM+, V63, P3362
[9]   REDUCTION OF SILICA IN HYDROGEN DISCHARGE [J].
MCTAGGART, FK .
NATURE, 1964, 201 (492) :1320-&
[10]   THERMAL NITRIDATION OF SILICON IN AMMONIA GAS - COMPOSITION AND OXIDATION RESISTANCE OF THE RESULTING FILMS [J].
MURARKA, SP ;
CHANG, CC ;
ADAMS, AC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (06) :996-1003