EXPERIMENTAL-STUDY OF THE COPPER THIOSULFATE SYSTEM WITH RESPECT TO THIN-FILM DEPOSITION

被引:45
|
作者
GROZDANOV, I [1 ]
BARLINGAY, CK [1 ]
DEY, SK [1 ]
RISTOV, M [1 ]
NAJDOSKI, M [1 ]
机构
[1] UNIV KIRIL & METODIJ,FAC NAT SCI & MATH,SKOPJE,MACEDONIA
关键词
D O I
10.1016/0040-6090(94)90167-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An experimental study of the copper-thiosulfate system in mild acidic (pH similar to 5) aqueous solutions, with respect to thin-film formation, was undertaken. Thin films of CuxS (1 less than or equal to x less than or equal to 2) were deposited by a simple electroless technique on glass or transparent polyester films, at 50 degrees C. Thin films were deposited from chemical baths in which the ratios of copper to thiosulfate were varied from 1:1 to 1:10. Thin films of different compositions (Cu2S, Cu1.8S, Cu1.4S and CuS) were prepared and then characterized for morphological, optical and electrical properties. The deposited films chemically close to Cu2S were found to be amorphous, while the CuS films were a mixture of both amorphous and polycrystalline phases. The optical spectra of the Cu2S films exhibited high transmission both in the visible region of the spectrum (beyond 600 nm) and throughout the near-infrared region (800 to 2500 nm), while CuS films were found to be highly absorptive throughout the near-infrared region, with peaked transmission in the visible region at about 560 nm. The sheet resistances of the films, determined by the standard four-probe measurements, were between 100 and 650 Ohm/square.
引用
收藏
页码:67 / 71
页数:5
相关论文
共 50 条
  • [31] THIN-FILM DEPOSITION TECHNIQUES IN MICROELECTRONICS
    SEQUEDA, FO
    JOURNAL OF METALS, 1986, 38 (02): : 55 - 65
  • [33] SELECTING THIN-FILM DEPOSITION EQUIPMENT
    GRAPER, EB
    RESEARCH-DEVELOPMENT, 1975, 26 (02): : 49 - &
  • [34] Rare-Earth Thin-Film Deposition and Oxidation Study
    Le Tacon, S.
    Brodier, A.
    Chicanne, C.
    Theobald, M.
    FUSION SCIENCE AND TECHNOLOGY, 2016, 70 (02) : 351 - 357
  • [35] Novel thin-film deposition method and system with IR-FEL
    Yasumoto, M
    Umesaki, N
    Tomimasu, T
    Ishizu, A
    Awazu, K
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING V, 2000, 3933 : 496 - 501
  • [36] MULTIPLE SUBSTRATE-MASK-SOURCE THIN-FILM DEPOSITION SYSTEM
    KAZMERSK.LL
    MORGAN, GK
    PEDERSEN, AP
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1973, 44 (11): : 1658 - 1660
  • [37] IN-LINE SPUTTERING DEPOSITION SYSTEM FOR THIN-FILM DISK FABRICATION
    DRENNAN, GA
    LAWTON, RJ
    JACOBSON, MB
    HEWLETT-PACKARD JOURNAL, 1985, 36 (11): : 21 - 25
  • [38] EXPERIMENTAL-STUDY ON EMISSION FIELDS AND SPECTROSCOPIC CHARACTERISTICS OF THIN-FILM OPTICAL-WAVEGUIDE WITH PLANE DIFFRACTION GRATING
    KUZALI, AS
    CHEKAN, AV
    OPTIKA I SPEKTROSKOPIYA, 1978, 44 (01): : 148 - 150
  • [39] Thermosonic bonding of gold wire onto a copper pad with titanium thin-film deposition
    Aoh, JN
    Chuang, CL
    JOURNAL OF ELECTRONIC MATERIALS, 2004, 33 (04) : 290 - 299
  • [40] Thermosonic bonding of gold wire onto a copper pad with titanium thin-film deposition
    Jong-Ning Aoh
    Cheng-Li Chuang
    Journal of Electronic Materials, 2004, 33 : 290 - 299