PHOTOOXIDATION OF N-SUBSTITUTED ALIPHATIC POLYAMIDES BY ALKYL-GROUPS

被引:2
作者
FROMAGEOT, D
LEMAIRE, J
SALLET, D
机构
[1] CTR APPL LEVALLOIS,F-92300 LEVALLOIS PERRET,FRANCE
[2] LAB RECH MUSEES FRANCE,F-75041 PARIS 01,FRANCE
[3] UNIV CLERMONT FERRAND,PHOTOCHIM MOLEC & MACROMOLEC LAB,CNRS,UA 433,ENSEMBLE UNIV CEZEAUX,F-63177 CLERMONT FERRAND,FRANCE
关键词
D O I
10.1016/0014-3057(90)90145-T
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
引用
收藏
页码:1321 / 1328
页数:8
相关论文
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