Thin Pd-Ag layers were electroplated preferably on brass and on nickel substrates using a two-compartment cell separated by an anion exchange membrane. The weakly alkaline electrolyte contained glycine-glycinate as the major complexing agents. The plating experiments were usually carried out without stirring, at different potentials and temperatures and in the absence or in the presence of sodium benzaldehyde-2,4-disulphonate (BDS). The samples were characterized by scanning electron microscopy and light microscopy. Their compositions were determined analytically by the inductively coupled plasma technique. In addition, the film porosity was tested. Electrodeposition in almost limiting current conditions for both components and without simultaneous hydrogen evolution led to deposits with compositions being in good agreement with the molar metal ratio in the electrolyte (77:23). The best results were achieved between 0 and - 50 mV with respect to a reversible hydrogen electrode at 0-degrees-C in the presence of BDS. These deposits were bright, had good adherence and exhibited no pores at a film thickness of 1.2 mum. At too negative potentials, the deposits became black and powdery.
Key Laboratory of Analysis and Detection Technology for Food Safety of the Ministry of Education, Department of Chemistry, Fuzhou University, Fuzhou 350108, China
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Key Laboratory of Analysis and Detection Technology for Food Safety of the Ministry of Education, Department of Chemistry, Fuzhou University, Fuzhou 350108, China
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Chinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R China
Ma, Yuyu
Tang, Chunhua
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Chinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R ChinaChinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R China
Tang, Chunhua
Bao, Feng
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Chinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R ChinaChinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R China
Bao, Feng
Shao, Wei
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Chinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R ChinaChinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R China
Shao, Wei
Xu, Tianying
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Chinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R ChinaChinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R China
Xu, Tianying
Li, Hui
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Chinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R ChinaChinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R China
Li, Hui
Xu, Hengyong
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Chinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R ChinaChinese Acad Sci, Dalian Inst Chem Phys DICP, Dalian 116023, Peoples R China
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TECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
TECNALIA, Ind & Transport Div, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
Eindhoven Univ Technol, Dept Chem Engn & Chem, Chem Proc Intensificat, Den Dolech 2, NL-5612 AD Eindhoven, NetherlandsTECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
Fernandez, Ekain
Antonio Medrano, Jose
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Eindhoven Univ Technol, Dept Chem Engn & Chem, Chem Proc Intensificat, Den Dolech 2, NL-5612 AD Eindhoven, NetherlandsTECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
Antonio Medrano, Jose
Melendez, Jon
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TECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
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Univ Basque Country UPV EHU, Chem Engn & Environm Dept, C Alameda Urquijo S-N, Bilbao 48013, SpainTECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
Melendez, Jon
Parco, Maria
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TECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
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Parco, Maria
Luis Viviente, Jose
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TECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
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Luis Viviente, Jose
Annaland, Martin van Sint
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Eindhoven Univ Technol, Dept Chem Engn & Chem, Chem Proc Intensificat, Den Dolech 2, NL-5612 AD Eindhoven, NetherlandsTECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
Annaland, Martin van Sint
Gallucci, Fausto
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Eindhoven Univ Technol, Dept Chem Engn & Chem, Chem Proc Intensificat, Den Dolech 2, NL-5612 AD Eindhoven, NetherlandsTECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
Gallucci, Fausto
Pacheco Tanaka, D. A.
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TECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
TECNALIA, Ind & Transport Div, Mikeletegi Pasealekua 2, San Sebastian 20009, SpainTECNALIA, Div Energy & Environm, Mikeletegi Pasealekua 2, San Sebastian 20009, Spain
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Department of Physics, University of Notre Dame, Notre Dame, IN 46556, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
Lahiri, Debdutta
Bunker, Bruce
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Department of Physics, University of Notre Dame, Notre Dame, IN 46556, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
Bunker, Bruce
Mishra, Bhoopesh
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Department of Physics, University of Notre Dame, Notre Dame, IN 46556, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
Mishra, Bhoopesh
Zhang, Zhenyuan
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Radiation Laboratory and Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN 46556, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
Zhang, Zhenyuan
Meisel, Dan
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Radiation Laboratory and Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN 46556, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
Meisel, Dan
Doudna, C.M.
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Departments of Physics, Chemistry and Nuclear Engineering, University of Missouri-Rolla, MO 65409, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
Doudna, C.M.
Bertino, M.F.
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Bertino, M.F.
Blum, Frank D.
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Departments of Physics, Chemistry and Nuclear Engineering, University of Missouri-Rolla, MO 65409, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
Blum, Frank D.
Tokuhiro, A.T.
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Tokuhiro, A.T.
Chattopadhyay, Soma
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Department of Biological, Chemical and Physical Sciences (BCPS), Illinois Institute of Technology, Chicago, IL 60616, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
Chattopadhyay, Soma
Shibata, Tomohiro
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Shibata, Tomohiro
Terry, Jeff
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Department of Biological, Chemical and Physical Sciences (BCPS), Illinois Institute of Technology, Chicago, IL 60616, United StatesDepartment of Physics, University of Notre Dame, Notre Dame, IN 46556, United States
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Univ Petr & Energy Studies, Sch Engn, Appl Sci Cluster, Dehra Dun 248007, IndiaUniv Petr & Energy Studies, Sch Engn, Appl Sci Cluster, Dehra Dun 248007, India
Wadhwa, Shikha
Dey, Arka Bikash
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Deutsch Elektronen Synchrotron DESY, Notkestr 85, D-22607 Hamburg, GermanyUniv Petr & Energy Studies, Sch Engn, Appl Sci Cluster, Dehra Dun 248007, India
Dey, Arka Bikash
Bertram, Florian
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Bertram, Florian
Khan, Saif A.
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Khan, Saif A.
Pandey, Ratnesh
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Gupta, Mukul
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Chawla, Vipin
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Rao, Akula Umamaheswara
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Avasthi, D. K.
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