FORMATION OF BURIED EPITAXIAL CO SILICIDES BY ION-IMPLANTATION

被引：41

作者：

KOHLHOF, K ^{[1
]}

MANTL, S ^{[1
]}

STRITZKER, B ^{[1
]}

JAGER, W ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM JULICH, INST FESTKORPERFORSCH, D-5170 JULICH 1, FED REP GER

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(89)90786-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：276 / 279

页数：4

共 10 条

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[2]

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[8] MESOTAXY - SINGLE-CRYSTAL GROWTH OF BURIED COSI2 LAYERS [J].

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GIBSON, JM .

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[9]

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[10]

WHITE AE, 1988, MATER RES SOC S P, V100, P3

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