Electrodeposition of Ni-S Film Based on Nickel Foam with Enhanced Activity for Oxygen Evolution Reaction

Ni-S film based on Ni foam (NF) has been fabricated by electrodeposition in room temperature. To compare differences of morphology and electrocatalysis from different substrate, Ni-S film on FTO has also been prepared under identical condition. XRD results demonstrate that Ni-S film is amorphous on both substrates. NF based Ni-S film in SEM images is composed of many nanoparticles, suggesting larger surface area and more active sites for oxygen evolution reaction (OER). Electrochemical measurements confirm enhanced activity of Ni-S/NF for OER, with earlier onset potential (1.45 V vs. RHE), remarkable large current density and excellent stability. The great decrease of electrochemical impedance spectroscopy (EIS) of Ni-S/NF can be attributed to better conductivity of NF, accelerating oxygen evolution process with higher electron transfer efficiency. It may offer a facile approach to obtain Ni-S film with proper substrate for enhanced OER performances.