STRUCTURE OF CHEMICALLY DEPOSITED NICKEL

被引:144
作者
GOLDENSTEIN, AW
ROSTOKER, W
SCHOSSBERGER, F
GUTZEIT, G
机构
关键词
D O I
10.1149/1.2428503
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:104 / 110
页数:7
相关论文
共 17 条
[1]  
Barrington T. P., 1955, US Patent, Patent No. [2,717, 218, 2717218]
[2]  
BOWMAN J, 1951, XRAY CRYSTALLOGRAPHY, P191
[3]   DEPOSITION OF NICKEL AND COBALT BY CHEMICAL REDUCTION [J].
BRENNER, A ;
RIDDELL, G .
JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1947, 39 (05) :385-395
[4]  
FRANKE W, 1942, LIEBIGS ANN CHEM, V550, P1
[5]  
GLOCKER R, 1949, MATERIALPRUFUNG RONT
[6]  
Guiner A., 1952, XRAY CRYSTALLOGRAPHI
[7]  
GUTZEIT G, 1954, PLATING, V41, P14
[8]  
GUTZEIT G, 1953, Patent No. 2658841
[9]  
Gutzeit G., 1954, US Patent, Patent No. [2,694,019, 2694019]
[10]  
GUTZEIT G, 1954, METAL PROGR, V65, P113