OCTADECYLTRICHLOROSILANE MONOLAYERS AS ULTRATHIN GATE INSULATING FILMS IN METAL-INSULATOR-SEMICONDUCTOR DEVICES

被引:92
作者
FONTAINE, P [1 ]
GOGUENHEIM, D [1 ]
DERESMES, D [1 ]
VUILLAUME, D [1 ]
GARET, M [1 ]
RONDELEZ, F [1 ]
机构
[1] INST CURIE,PHYS & CHIM SECT,PHYSICOCHIM SURFACES & INTERFACES LAB,CNRS,F-75231 PARIS 05,FRANCE
关键词
D O I
10.1063/1.109433
中图分类号
O59 [应用物理学];
学科分类号
摘要
In order to fabricate metal-insulator-semiconductor (MIS) devices with gate insulating films thinner than 5.0 nm, organic monolayers have been grafted on the native oxide layer of silicon wafers. We demonstrate that a single monolayer of octadecyltrichlorosilane with a 2.8 nm thickness allows to fabricate a silicon based MIS device with gate current density as low as 10(-8) A/cm2 at 5.8 MV/cm, insulator charge density lower than 10(10) cm-2, fast interface state density of the order of 10(11) CM-2 eV-1, and dielectric breakdown field as high as 12 MV/cm. Moreover, this insulating film is thermally stable up to 450-degrees-C.
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页码:2256 / 2258
页数:3
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