SLITS AND HIGH-RESOLUTION X-RAY-DIFFRACTION

被引:8
|
作者
VANDERSLUIS, P
机构
[1] Philips Research Lab, Eindhoven
关键词
D O I
10.1107/S0021889894005911
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
It is shown that, with proper use of an anti-scatter slit in front of the detector, the signal-to-noise ratio of a symmetric high-resolution X-ray diffraction scan can be improved by a factor of ten. By the use of an asymmetric reflection with a high angle of incidence on the sample, the size of the diffracted beam can be reduced sufficiently to allow for two-dimensional reciprocal-space scans with a simple slit instead of a crystal assembly in front of the detector for enhanced resolution. By selection of the proper reflection, a resolution can be chosen that suits the application. Examples include a partially relaxed SiGe multilayer and a periodic surface grating.
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页码:1015 / 1019
页数:5
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