CHEMICAL-VAPOR-DEPOSITED MOLYBDENUM FILMS OF HIGH INFRARED REFLECTANCE

Molybdenum thin films deposited by pyrolytic decomposition of molybdenum carbonyl attain, after anneal in a reducing atmosphere at 1000°C, infrared reflectance values within 0.7% of the reflectance of supersmooth bulk molybdenum. This result combines the refractory nature of molybdenum with the high infrared reflectance generally associated with conventional mirror materials. The entire production sequence proceeds at atmospheric pressure and requires less than 1 h. The reflectance increase during anneal is related to compositional and structural properties of the films. The importance of this development to photothermal solar-energy conversion and high-energy laser technology is stressed.