PROXIMITY EFFECT CORRECTION FOR HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY

被引：16

作者：

ABE, T

TAKIGAWA, T

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 11期

关键词：

D O I：

10.1063/1.343283

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4428 / 4434

页数：7

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