CHARACTERIZATION OF BORON DIFFUSION FROM DOPED OXIDE SOURCE

被引：1

|

作者：

HUANG, JST ^{[1
]}

机构：

[1] HONEYWELL INC,SOLID STATE ELECTR CTR,PLYMOUTH,MN 55441

来源：

SOLID-STATE ELECTRONICS | 1973年 / 16卷 / 02期

关键词：

D O I：

10.1016/0038-1101(73)90039-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：279 / 281

页数：3

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