TOTAL-REFLECTION X-RAY-FLUORESCENCE SPECTROSCOPY

被引：86
作者：
KLOCKENKAMPER, R [1 ]
KNOTH, J [1 ]
PRANGE, A [1 ]
SCHWENKE, H [1 ]
机构：
[1] GKSS, FORSCHUNGSZENTRUM GEESTHACHT GMBH, INST PHYS, W-2054 GEESTHACHT, GERMANY
来源：
ANALYTICAL CHEMISTRY | 1992年 / 64卷 / 23期
关键词：
D O I：
10.1021/ac00047a001
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：A1115 / +
页数：1
相关论文
共 31 条
[1]   METHOD FOR QUANTITATIVE X-RAY-FLUORESCENCE ANALYSIS IN NANOGRAM REGION [J].
AIGINGER, H ;
WOBRAUSC.P .
NUCLEAR INSTRUMENTS & METHODS, 1974, 114 (01) :157-158
[2]   X-RAY STANDING WAVES AT A REFLECTING MIRROR SURFACE [J].
BEDZYK, MJ ;
BOMMARITO, GM ;
SCHILDKRAUT, JS .
PHYSICAL REVIEW LETTERS, 1989, 62 (12) :1376-1379
[3]   DETERMINATION OF METALS IN OIL USING TOTAL REFLECTION X-RAY-FLUORESCENCE SPECTROMETRY [J].
BILBREY, DB ;
LELAND, DJ ;
LEYDEN, DE ;
WOBRAUSCHEK, P ;
AIGINGER, H .
X-RAY SPECTROMETRY, 1987, 16 (04) :161-165
[4]   GLANCING-INCIDENCE X-RAY-FLUORESCENCE OF LAYERED MATERIALS [J].
DEBOER, DKG .
PHYSICAL REVIEW B, 1991, 44 (02) :498-511
[5]  
EICHINGER P, 1989, ASTM SPEC TECH PUBL, V990, P305
[6]   COMPARISON OF WAFER CLEANING PROCESSES USING TOTAL REFLECTION X-RAY-FLUORESCENCE (TXRF) [J].
HOCKETT, RS ;
KATZ, W .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (11) :3481-3486
[7]  
HOCKETT RS, 1990, NIST SPEC PUBL, V801, P239
[8]  
IIDA A, 1988, ADV XRAY ANAL, V31, P487
[9]   A NUMERICAL-SIMULATION OF TOTAL REFLECTION X-RAY PHOTOELECTRON-SPECTROSCOPY (TRXPS) [J].
KAWAI, J ;
TAKAMI, M ;
FUJINAMI, M ;
HASHIGUCHI, Y ;
HAYAKAWA, S ;
GOHSHI, Y .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1992, 47 (08) :983-991
[10]   QUANTIFICATION IN TOTAL REFLECTION X-RAY-FLUORESCENCE ANALYSIS OF MICROTOME SECTIONS [J].
KLOCKENKAMPER, R ;
VONBOHLEN, A ;
WIECKEN, B .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1989, 44 (05) :511-517
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