DETERMINATION OF HIGH-DOSE IMPLANTATION PROFILES USING LOW-ANGLE RUTHERFORD BACKSCATTERING

被引：16
作者：
CHRISTODOULIDES, CE
GRANT, WA
WILLIAMS, JS
机构：
来源：
NUCLEAR INSTRUMENTS & METHODS | 1978年 / 149卷 / 1-3期
关键词：
D O I：
10.1016/0029-554X(78)90863-7
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：219 / 224
页数：6
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