PROCESS CHARACTERIZATION FOR LPCVD DEPOSITION OF SIO2-FILMS FROM TEOS LIQUID SOURCE

被引：5

作者：

ROJAS, S ^{[1
]}

SERRA, P ^{[1
]}

WU, WS ^{[1
]}

SANTARELLI, F ^{[1
]}

SARTI, GC ^{[1
]}

MINNI, F ^{[1
]}

机构：

[1] UNIV BOLOGNA,DIPARTIMENTO INGN CHIM & PROC,I-40136 BOLOGNA,ITALY

来源：

JOURNAL DE PHYSIQUE | 1989年 / 50卷 / C-5期

关键词：

D O I：

10.1051/jphyscol:1989513

中图分类号：

学科分类号：

摘要：

引用

页码：83 / 90

页数：8

共 14 条

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