TEMPERATURE-GRADIENT-DRIVEN DIFFUSION IN RAPID-RATE SINTERING - COMMENT

被引：25
|
作者：
JOHNSON, DL
机构：
[1] Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois
来源：
JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1990年 / 73卷 / 08期
关键词：
D O I：
10.1111/j.1151-2916.1990.tb07642.x
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
[No abstract available]
引用
收藏
页码：2576 / 2578
页数：3
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