GUIDED ION-BEAM STUDIES OF THE REACTIONS OF O+, O-2+, N+ AND N-2+ WITH SILANE

Guided ion beam mass spectrometry is used to measure the cross sections as a function of kinetic energy for reaction of SiH4 with O+ (4S), O2+ (2PI(g), v = 0), N+ (3P), and N2+ (2SIGMA(g)+, v = 0). All four ions react with silane by dissoCiatiVe charge-transfer to form SiHm+ (m = 0-3), and all but N2+ also form SiXHm+ products where (m = 0-3) and X = O, O2 or N. The overall reactivity of the O+, O2+, and N+ systems show little dependence on kinetic energy, but for the case of N2+, the reaction probability and product distribution relies heavily on the kinetic energy of the system. The present results are compared with those previously reported for reactions of the rare gas ions with silane [13] and are discussed in terms of vertical ionization from the 1t2 and 3a1 bands of SiH4. Thermal reaction rates are also provided and dicussed.